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From:
Bo Li, Hong-Ping Zhao, Xi-Qiao Feng (Department of Engineering Mechanics, Tsinghua University, Beijing 100084, China),
“Spontaneous instability of soft thin films on curved substrates due to van der Waals interaction”, Journal of the Mechanics and Physics of Solids, Vol. 59 (2011) 610-624, doi: 10.1016./j.jmps.2010.12.009
ABSTRACT: The linear bifurcation theory is used to investigate the stability of soft thin films bonded to curved substrates. It is found that such a film can spontaneously lose its stability due to van der Waals or electrostatic interaction when its thickness reduces to the order of microns or nanometers. We first present the generic method for analyzing the surface stability of a thin film interacting with the substrate and then discuss several important geometric configurations with either a positive or negative mean curvature. The critical conditions for the onset of spontaneous instability in these representative examples are established analytically. Besides the surface energy and Poisson’s ratio of the thin film, the curvature of the substrate is demonstrated to have a significant influence on the wrinkling behavior of the film. The results suggest that one may fabricate nanopatterns or enhance the surface stability of soft thin films on curved solid surfaces by modulating the mechanical properties of the films and/or such geometrical properties as film thickness and substrate curvature. This study can also help to understand various phenomena associated with surface instability.
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